Exposing: essential precision in pattern transfer
In the exposing step, UV light projects circuit patterns onto a photoresist-coated wafer. That takes accuracy, as even the tiniest shift or blur has impact. Stay ahead of those risks and create precise patterns and alignment to make sure every device works as intended.
Equip high-precision lithography systems
Exposing calls for exact wafer positioning, stable stages and accurate reticle alignment. Therefore, our sensors handle wafer detection, stage monitoring and alignment feedback. And to stop particles from settling? With our ionizers you remove static charge where it matters most.
Supporting next-generation lithography requirements
As chips get smaller, tolerances tighten and contamination becomes more of a risk. Advanced masks and exposure tools need nanometer-level stability. That means precise motion, clean conditions and reliable monitoring. Our components help you keep control. Ranging from accurate alignment to effective charge management, now and for the future.
Reliable wafer detection with the Panasonic HG-T Sensor.
The semiconductor industry is working with more diverse wafer materials than ever. We tested our Panasonic HG-T sensor on silicon, glass, and SiC wafers to check orientation flat detection.
Key takeaways:
- Accurate and stable results for all wafer types. Even transparent ones.
- Minimal deviation for silicon and glass; SiC showed slight variation due to surface scratches.
- Notch wafers achieved even higher positioning accuracy.
This technology helps manufacturers position wafers quickly and reliably crucial for advanced electronics.
