Developing: reliable results after exposure
After exposure, the photoresist is developed to reveal the pattern. A chemical solution removes either the exposed or unexposed parts, depending on the resist type. This step sets the stage for all that follows in your patterning process, as it has to be completely right.
Support controlled developing systems
Development tools need clean handling, stable wafer conditions and precise liquid control. How do you keep that level of control? Explore our sensors, as they detect wafer presence, monitor tilt and position nozzles with accuracy. They also catch level changes early, while our ionizers prevent static build-up during wafer transfer.
Ready for advanced requirements
Modern resists are more sensitive. Structures are finer. That means you need tight control throughout development. Our components help keep things consistent, as they support clean development and reduce particle risk. Moreover, they ensure stable wafer handling across every batch, even as conditions change and process demands grow.
